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Автор: Michael Wang
Издательство: Intech
Год издания: 2010
isbn: 9533070641
Количество страниц: 678
Язык: english
Формат: PDF
Размер: 78 Мб
Каталожный номер: 44969
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Lithography, the fundamental fabrication process of semiconductor devices, is playing a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. Traditional optical lithography (photolithography) including contact and project photolithography has contributed significantly to the semiconductor device advancements. As the resolution requirement increases for fabrication of finer and smaller components and devices, the technological dependence on photolithography becomes a serious problem since the photolithography resolution is restricted by the diffraction limitation of optics. Reducing the light wavelength from blue to near ultraviolet (UV) and to deep UV is expected to improve the photolithography resolution, but it is far not enough to catch up with the pace in resolution demand in integrated circuit fabrication.
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